The $500million, five year programme is intended to accelerate the introduction of extreme ultraviolet (EUV) lithography technologies into manufacturing. The centre, which will feature a network of chipmakers and material and equipment suppliers, will generate 100 jobs.
Dr Alain Kaloyeros, SUNY Poly’s president and CEO, said: “In partnership with Globalfoundries, IBM and Tokyo Electron, we will leverage our combined expertise and technological capabilities to meet the critical needs of the industry and advance the introduction of this complex technology.”
The APPC will address the challenges associated with commercialising EUV technology. A key feature of the centre will be an ASML NXE:3300 EUV scanner, which will work alongside the ASML NXE:3300B EUV scanner already in place at SUNY Poly and supported by IBM.
APPC will also look to bring mask and materials suppliers together to extend the capabilities of EUV lithography by exploring the fundamental aspects of the patterning process. Other projects will focus on enhancing productivity, in preparation for implementing EUV lithography at Globalfoundries’ production facility in Malta NY.
“Globalfoundries is committed to an aggressive research roadmap that pushes the limits of semiconductor technology,” said Dr Gary Patton, the company’s chief technology officer. “With the recent acquisition, Globalfoundries has gained direct access to IBM’s continued investment in world-class semiconductor research and has significantly enhanced its ability to develop leading-edge technologies. Together with SUNY Poly, the centre will improve our capabilities and position us to advance our process geometries at 7nm and beyond.”
