European project to use nanoimprinting for highly efficient solar cells
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Seven European organisation are collaborating to develop a disruptive solar cell concept in which advanced light trapping schemes will be integrated into thin crystalline-Si (c-Si) based solar cells through the use of nanoimprint lithography.
The three year PhotoNvoltaics project aims to create a highly efficient, sustainable and low cost nanopatterned thin film c-Si cells that can be manufactured on an industrial scale.
Nanoimprint and other lithographic techniques will be used to apply the light manipulation capabilities developed in the field of photonics into c-Si based photovoltaics.
The goal is to build a nanotextured thin film c-Si cell with the highest current enhancement yet reached. The solar cell will, say the partners, combine the advantages of wafer based c-Si technology with the simplicity and low cost of thin film solar cell technologies.
Thin c-Si based solar cells have a number of advantages over other thin film based approaches, says the project, but light absorption losses are currently hindering their further development. A key challenge will be to identify and integrate nanotextures into c-Si based cells without compromising their electrical properties.
The seven project partners are Obducat Technologies, Total, imec, Institut des Nanotechnologies de Lyon, Laboratoire de Physique des Interfaces et des Couches Minces, University of Namur and Chalmers University of Technology. Imec is coordinating the project and will be responsible for the fabrication and development of ultrathin mono- and polycrystalline films and solar cells with photonic crystals.
