EUV cooperation programme

UCD researchers will use vacuum equipment provided by Powerlase to study ion emissions from the LPP euv source. This approach, says Powerlase, is the most promising technology for the high volume manufacture of semiconductors at 32nm and beyond. Dr Samir Ellwi, vp of strategic innovations for Powerlase, said: “Powerlase is very excited to be working with the leading academics at UCD to support the development of euv sources for next generation lithography. We believe the LPP source approach, which is driven by a diode pumped solid state laser, is the way forward in achieving the requirements for the euv source. We are committed to providing the industry with a workable laser solution and supporting euv development.” Professor Gerry O’Sullivan, Head of UCD’s School of Physics, added: “Our work with Powerlase will be extremely valuable in progressing the euv R&D programme and strengthening our links with the major industrial players in this exciting and important field.”