ASML, imec to explore sub 10nm patterning
ASML and imec have launched an Advanced Patterning Center, aimed at overcoming scaling challenges as process dimensions shrink. The centre, at the imec campus, is expected to grow to close to 100 engineers over the next couple of years.
"ASML and imec have been partners for almost as long as both organizations exist and, while we have both benefited from this relationship, I believe the biggest beneficiary has been the chip industry," said Martin van den Brink, ASML's president and chief technology officer. "I'm confident this continued investment in our joint capabilities will further accelerate technology development and new device introductions."
The APC blends complementary expertise from both partners. Imec will offer its 300mm clean room infrastructure, while ASML will provide advanced scanners, metrology systems and holistic lithography solutions.
Luc Van den hove, imec's president and ceo, added: "The global partner network of both companies will have access to the most advanced patterning processes for sub 10nm technologies. This is crucial to better address future scaling and infrastructure challenges."
