IBM makes high k move
IBM, in conjunction with AMD, Sony and Toshiba, has announced its high k metal gate technology has been ‘inserted’ into a manufacturing line at its East Fishkill fab, where it will be used to build 45nm devices starting next year.
“Until now, the chip industry was facing a major roadblock in terms of how far we could push current technology," said Dr TC Chen, IBM Research’s vice president of Science and Technology. “After more than 10 years of effort, we now have a way forward. With chip technology so pervasive in our everyday lives, this work will benefit people in many ways.”
IBM’s high k metal gate approach uses a new material to help control the transistor’s primary on/off switching function. The material provides better electrical properties than its predecessor, enhancing the transistor’s function while also allowing the transistor to continue to be shrunk.
