The Multibeam (MB) platform is described as a major step forward for the semiconductor industry, offering a high-throughput direct write patterning system that is orders of magnitude faster and more productive than conventional e-beam tools. The MB system will be available to SkyWater customers for early concept prototyping and rapid production.
MEBL enables several new production capabilities for SkyWater’s customers including secure chip ID for anti-counterfeit applications and full wafer patterning to support focal plane read-out ICs and other types of large format die.
MEBL also offers large depth of focus for a range of high topology microfluidic and MEMS architectures, curvilinear designs for photonics, and high-density MOS. In addition, it is the only production lithography tool capable of sub 50 nm geometries on 200 mm wafers.
Configured with multiple miniaturised electron beam columns, the MB platform elevates E-Beam Lithography (EBL) to a breakthrough maskless lithography production system with a number of performance and cost advantages for modern IC fabs. The delivery of the first Multibeam system follows a close collaboration with SkyWater over the past two years. This partnership provided critical fab operational insights which were used to define key system performance specifications before delivery of the MB platform to SkyWater.
According to Multibeam Chairman and CEO, Dr. David K. Lam, “This is a significant milestone for Multibeam and we are immensely proud to share it with SkyWater. From the outset of our engagement with SkyWater they supported our mission to re-innovate EBL for high-volume production and provided critical user perspectives that helped us accelerate our development program and commercialize a world-class maskless lithography system.”
SkyWater CEO and Director, Thomas Sonderman emphasised the value of this technology for customers across target growth markets, “The deployment of the MB platform will expand capabilities and time to market for innovators on the concept-to-production journey in secure defence, biomedical, thermal imaging, high reliability and advanced compute markets.”
Sonderman added, “Our engagement with Multibeam exemplifies the power of partnerships in developing breakthrough equipment to accelerate chip innovation in the U.S. and positions SkyWater’s Minnesota fab with the most advanced 200 mm lithography in the world.”
SkyWater will enable access to the tool for initial customer designs in 4Q24.
