ST joins programme for maskless lithography
1 min read
STMicroelectronics has signed an agreement with French semiconductor research institute, CEA-Leti, to join the multi partner programme Imagine for maskless lithography for ic manufacturing.
The three year programme is designed to allow companies to assess a maskless lithography infrastructure for ic manufacturing and the use of Mapper technology for high throughput. The multiple e-beam lithography programme covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.
Joel Hartmann, silicon technology development director at ST said: "STMicroelectronics has been working for more than a decade with CEA-Leti on maskless lithography. Together, ST and CEA-Leti have established a full shaped beam capability on ST's Crolles pilot line and demonstrated the insertion of e-beam technology in a standard cmos process flow. Joining the Imagine programme is a logical step for ST to get across to maskless lithography possible solution for future technology nodes."
Leti's ceo, Laurent Malier(pictured), said: "The Imagine programme will benefit from the strong knowledge and support of STMicroelectronics in maskless technology. The experience of CEA-Leti in e-beam technology has been strengthened over the years by this partnership with ST for using e-beam for advanced technology demonstrators. With STMicroelectronics supporting the Imagine programme, we are convinced we will succeed to make maskless lithography a viable solution."
